Fundamentals of III-V semiconductor MOSFETs /
Fundamentals of III-V semiconductor MOSFETs /
edited by Serge Oktyabrsky, Peide Ye.
- New York : Springer, c2010.
- xv, 445 p. : ill. ; 24 cm.
Subjects
Metal oxide semiconductor field-effect transistors -- Design and construction.
Electronic circuit design.
Includes bibliographical references and index.
Towards III-V digital MOSFET circuits.- Physics of compound semiconductors: band-engineered heterostructures and strain effects.- Physics and modeling of compound semiconductor MOSFETs.- P-channel MOSFETs.- Compound semiconductor technology: MBE and MOCVD.- Properties and trade-offs of compound semiconductor MOSFETs.- Electronic structure and properties of high-k gate oxides.- Interface chemistry of III-V's with oxides.- Heterostructure FETs for digital circuits.- Interface passivation techniques.- Source/drain contact technologies.- MOSFETs with Ga2O3 gate oxide.- MOSFETs with ALD high-k oxides.- Narrow bandgap MOSFETs: InAs and InSb as channel materials.- GaN based MOSFETs.- Electrical measurement issues for gate stacks and FETs.- Circuits with III-V MOSFETs.
9781441915467 (alk. paper) 144191546X (alk. paper) 9781441915474 (eISBN)
2010920631
Metal oxide semiconductor field-effect transistors--Design and construction.
Electronic circuit design.
TK7871.95 / .F86 2010
621.3815284 FUN / 2010
Subjects
Metal oxide semiconductor field-effect transistors -- Design and construction.
Electronic circuit design.
Includes bibliographical references and index.
Towards III-V digital MOSFET circuits.- Physics of compound semiconductors: band-engineered heterostructures and strain effects.- Physics and modeling of compound semiconductor MOSFETs.- P-channel MOSFETs.- Compound semiconductor technology: MBE and MOCVD.- Properties and trade-offs of compound semiconductor MOSFETs.- Electronic structure and properties of high-k gate oxides.- Interface chemistry of III-V's with oxides.- Heterostructure FETs for digital circuits.- Interface passivation techniques.- Source/drain contact technologies.- MOSFETs with Ga2O3 gate oxide.- MOSFETs with ALD high-k oxides.- Narrow bandgap MOSFETs: InAs and InSb as channel materials.- GaN based MOSFETs.- Electrical measurement issues for gate stacks and FETs.- Circuits with III-V MOSFETs.
9781441915467 (alk. paper) 144191546X (alk. paper) 9781441915474 (eISBN)
2010920631
Metal oxide semiconductor field-effect transistors--Design and construction.
Electronic circuit design.
TK7871.95 / .F86 2010
621.3815284 FUN / 2010